ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,708,000, issued on Aug. 11, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Semiconductor structure and manufacturing method thereof" was invented by Chen-Hua Yu (Hsinchu City, Taiwan), Kai-Chiang Wu (Hsinchu City, Taiwan) and Chun-Lin Lu (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a first dielectric layer, a first die, a second die, a first molding, and a second molding. The first die is disposed under the first dielectric layer, and has a first surface facing the first dielectric layer and a second surface opposite to the first surface. The second die is dispos...