ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,623, issued on Aug. 11, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor device structure" was invented by Ta-Chun Lin (Hsinchu, Taiwan) and Kuo-Hua Pan (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device structure is provided. The semiconductor device structure includes a first device formed over a substrate, and the first device comprises a first channel structure. The semiconductor device structure includes a first gate stack wrapped around the first channel structure, and a second device formed over the first device. The second device comprises a plurality o...