ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,929, issued on Aug. 11, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Method of cleaning a nozzle" was invented by Guan Jung Chen (Hsinchu, Taiwan), Shi-Ming Wang (Hsinchu, Taiwan), Chia-Hung Tsai (Hsinchu, Taiwan) and Yuan-Yu Feng (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning a nozzle of a gas supply system includes loading an apparatus including a carrier and an automated nozzle cleaning system in the carrier onto a load port containing a gas supply system. The automated nozzle cleaning system includes a first nozzle cleaning device, a second nozzle cleaning device and a ...