US Patent Issued to Taiwan Semiconductor Manufacturing on Aug. 11 for "Defect inspection system employing an image enhancing model and a defect detection model, and method of using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,940, issued on Aug. 11, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Defect inspection system employing an image enhancing model and a defect detection model, and method of using the same" was invented by Chih-Kai Yang (Taipei, Taiwan), Tung-Chin Wu (Hsinchu, Taiwan), Yu-Tien Shen (Tainan, Taiwan), Hsiang Ming Chang (Hsinchu, Taiwan), Chun-Yen Chang (Hsinchu, Taiwan), Ya Hui Chang (Hsinchu, Taiwan) and Zengqin Zhao (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes patterning a hard mask over a target layer, capturing a low resolution image of the hard mask, and enhancing the low resol...