US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 21 for "Photomask and method for inspecting photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,927, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Photomask and method for inspecting photomask" was invented by Chien-Hung Lai (Taichung City, Taiwan), Hao-Ming Chang (Pingtung City, Taiwan), Hsuan-Wen Wang (Kaohsiung City, Taiwan), Ching-Ting Yang (Tainan City, Taiwan), Cheng-Kuang Chen (Hsinchu, Taiwan) and Chien-Chao Huang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a photomask, including a plurality of pattern areas, each of the pattern areas is defined by a respective boundary, a first pattern area including a first mask feature, and...