US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 21 for "Method of manufacturing a semiconductor device and pattern formation method" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,789, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of manufacturing a semiconductor device and pattern formation method" was invented by Chih-Cheng Liu (Hsinchu, Taiwan), Ming-Hui Weng (New Taipei City, Taiwan), Jr-Hung Li (Chupei City, Taiwan), Yahru Cheng (Taipei, Taiwan), Chi-Ming Yang (Hsinchu City, Taiwan), Tze-Liang Lee (Hsinchu, Taiwan) and Ching-Yu Chang (Yuansun Village, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a pattern formation method, a photoresist layer is formed over a substrate by combining a first precursor and a second precursor in a vapor state to fo...