US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on April 21 for "Mask and method for forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,923, issued on April 21, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Mask and method for forming the same" was invented by Hsin-Chang Lee (Hsinchu County, Taiwan), Ping-Hsun Lin (New Taipei City, Taiwan), Pei-Cheng Hsu (Taipei City, Taiwan), Hsuan-I Wang (New Taipei City, Taiwan), Hung-Yi Tsai (Hsinchu County, Taiwan), Bo-Wei Shih (Changhua County, Taiwan) and Ta-Cheng Lien (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a reflective multilayer over a substrate; depositing a first capping layer over the reflective multilayer, wherein the first capping layer is ...