ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,264, issued on April 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Semiconductor processing tool and methods of operation" was invented by Yen-Liang Lin (Hsinchu, Taiwan), Yu-Kang Huang (Hsinchu, Taiwan) and Yu-Chuan Tai (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some implementations described herein provide a physical vapor deposition tool. The physical vapor deposition tool includes a magnet component, a single cathode, and a power circuit for biasing a pedestal that supports a semiconductor substrate. During a deposition operation that deposits an inert metal material, the physical vapor ...