ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,414, issued on Sept. 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and TSMC NANJING COMPANY Ltd. (Nanjing, China).

"Semiconductor device and manufacturing method thereof" was invented by Han-Yu Lin (Nantou County, Taiwan), Fang-Wei Lee (Hsinchu City, Taiwan), Kai-Tak Lam (Hsinchu City, Taiwan), Raghunath Putikam (Hsinchu City, Taiwan), Tzer-Min Shen (Hsinchu City, Taiwan), Li-Te Lin (Hsinchu City, Taiwan), Pinyen Lin (Rochester, N.Y.), Cheng-Tzu Yang (Hsinchu County, Taiwan), Tzu-Li Lee (Yunlin County, Taiwan) and Tze-Chung Lin (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method incl...