US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING, TSMC NANJING on Nov. 3 for "System, apparatus, and method for improving photoresist coating operations" (Taiwanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,723, issued on Nov. 3, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and TSMC NANJING COMPANY Ltd. (Nanjing, China).

"System, apparatus, and method for improving photoresist coating operations" was invented by Chun-Ming Chen (Hsinchu, Taiwan), Chien-Liang Lin (Hsinchu, Taiwan), Chun-Hsiang Wang (Hsinchu, Taiwan) and Jen-Yu Tsai (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A coating system and a method for using such a system comprising a vessel, a flexible container within the vessel, and a coating apparatus. The flexible container includes an outlet port, wherein the flexible container is config...