ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,345, issued on June 30, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan) and NATIONAL YANG MING CHIAO TUNG UNIVERSITY (Hsinchu City, Taiwan).
"Semiconductor device and method for forming the same" was invented by Bo-Wei Huang (New Taipei City, Taiwan), Chien-Te Tu (Hsinchu City, Taiwan) and Chee-Wee Liu (Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first transistor, a second transistor above the first transistor, and an isolation structure. The first transistor includes a first semiconductor channel layer, a first gate structure wrapping around the first semicon...