ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,055, issued on Aug. 25, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan) and National Chiao-Tung University (Hsinchu, Taiwan).

"Epitaxies of a chemical compound semiconductor" was invented by Hung-Wei Yu (Yilan County, Taiwan), Yi Chang (Hsinchu County, Taiwan) and Tsun-Ming Wang (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and structures includes providing a substrate, forming a prelayer over a substrate, forming a barrier layer over the prelayer, and forming a channel layer over the barrier layer. Forming the prelayer may include growing the prelayer at a graded temperature. Forming t...