ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,504,384, issued on Dec. 23, was assigned to SYNTEC RESOURCES Co. LTD. (Taoyuan, Taiwan).
"Wafer defect inspection system" was invented by Kang-Feng Fan (Hsinchu County, Taiwan) and Ping-Chun Chang (Hsinchu County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer defect inspection system is disclosed, and comprises a line light source, a camera and a processor, wherein the processor is configured to control the line light source to provide an inspection light to be incident on a wafer, wherein an included angle between the inspection light and the surface of the wafer ranges from 45deg to 90deg. After incidence on the wafer, the inspection l...