US Patent Issued to SUN YAT-SEN UNIVERSITY on Nov. 3 for "Hyaluronic acid-based hydrogel precursor solution, hyaluronic acid-based hydrogel and repair material thereof" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,092, issued on Nov. 3, was assigned to SUN YAT-SEN UNIVERSITY (Guangdong, China).

"Hyaluronic acid-based hydrogel precursor solution, hyaluronic acid-based hydrogel and repair material thereof" was invented by Lin Zhuang (Guangdong, China), Xiaolei Li (Guangdong, China) and Wuming Liu (Guangdong, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a hyaluronic acid-based hydrogel precursor solution, a hyaluronic acid-based hydrogel, a preparation method and a repair material thereof. The hyaluronic acid-based hydrogel precursor solution includes a component A and a component B; the component A is prepared by the foll...