US Patent Issued to Sumitomo Chemical on March 17 for "Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,639, issued on March 17, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern" was invented by Masahiko Shimada (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A carboxylate represented by formula (I), a resin comprising a structural unit derived from the carboxylate represented by formula (I), a resit composition comprising the carboxylate represented by formula (I) or a resin comprising a structural unit derived from the carboxylate represented by formula (I)."

The patent was filed on Oct. 31, 20...