US Patent Issued to Sumitomo Chemical on Dec. 2 for "Resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,528, issued on Dec. 2, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Resist composition and method for producing resist pattern" was invented by Hiromu Nakamura (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition includes (A1) a resin including a structural unit represented by formula (I) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator:wherein R1 and R2 each represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, X1 and X2 each represent a single bond or ...