US Patent Issued to Sumitomo Chemical on Aug. 25 for "Salt, acid generator, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,715,843, issued on Aug. 25, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Salt, acid generator, resist composition and method for producing resist pattern" was invented by Katsuhiro Komuro (Osaka, Japan), Saki Kato (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group, the group may have a substituent, -CH2- in the group may be replaced by -O-, -CO-, -S-, etc., X4, X5 and X6 ea...