ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,710,701, issued on Aug. 18, was assigned to STEK Co. LTD. (New Taipei City, Taiwan).
"Mask inspection apparatus" was invented by Ming-Sheng Chen (New Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask inspection apparatus includes a booth, a carrier, two linear scanners, a light source module and a control unit. The booth includes a platform including a slot. The carrier is movable along the slot. The carrier includes a support face for supporting the mask, guiding elements on the support face, and an inspection window in the support face. The support face extends above the platform. The linear image scanners are vertically movabl...