US Patent Issued to Stamford Devices on March 3 for "Photodefined aperture plate and method for producing the same" (California Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,565,710, issued on March 3, was assigned to Stamford Devices Ltd. (Galway, Ireland).

"Photodefined aperture plate and method for producing the same" was invented by Hong Xu (San Carlos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a method for manufacturing an aperture plate includes depositing a releasable seed layer above a substrate, applying a first patterned photolithography mask above the releasable seed layer, the first patterned photolithography mask having a negative pattern to a desired aperture pattern, electroplating a first material above the exposed portions of the releasable seed layer and defined by the first ...