US Patent Issued to SST on Oct. 20 for "High frequency reaction processing apparatus and high frequency reaction processing system" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,830, issued on Oct. 20, was assigned to SST INC. (Chiba, Japan).

"High frequency reaction processing apparatus and high frequency reaction processing system" was invented by Toshiyuki Takamatsu (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A high frequency reaction processing apparatus and a high frequency reaction processing system capable of reducing a loss of energy of an electromagnetic wave continuously returning to and passing through a propagation line in a loop are provided. A dielectric outer container 40, a covering conductor 43 made of a conductive material and kept at the same potential as ground potential of a high freque...