US Patent Issued to SOULBRAIN on Dec. 2 for "Cerium oxide particles, chemical mechanical polishing slurry composition comprising same, and method for manufacturing semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,429, issued on Dec. 2, was assigned to SOULBRAIN Co. LTD. (Seongnam-si, South Korea).

"Cerium oxide particles, chemical mechanical polishing slurry composition comprising same, and method for manufacturing semiconductor device" was invented by Jeong Ho Lee (Seongnam-si, South Korea) and Seok Joo Kim (Seongnam-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ce3+ and Ce4+. When the cerium oxide particles are used, they may exhibit a high o...