US Patent Issued to Sony Semiconductor Solutions on June 23 for "Face deformation compensating method for face depth image, imaging device, and storage medium" (Chinese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,664,627, issued on June 23, was assigned to Sony Semiconductor Solutions Corp. (Atsugi, Japan).

"Face deformation compensating method for face depth image, imaging device, and storage medium" was invented by Joseph Salini (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a face deformation compensating method for a face depth image, an imaging device and a storage medium. The face deformation compensating method comprising: creating a generic face deformation map, the generic face deformation map including a generic face landmark data; obtaining a user face image; and applying the generic face deformation map to ...