US Patent Issued to Sony Group on Feb. 3 for "Position adjusting method, microparticle analysis device, and program" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,894, issued on Feb. 3, was assigned to Sony Group Corp. (Tokyo).

"Position adjusting method, microparticle analysis device, and program" was invented by Shinichi Kai (Tokyo), Junji Kajihara (Tokyo), Koji Kita (Kanagawa, Japan), Naohisa Sakamoto (Kanagawa, Japan) and Kazuya Takahashi (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "To provide an adjusting method of a positional relationship between a flow path position and a light irradiation position.The present technology provides a position adjusting method provided with an imaging step of imaging, while moving a flow path through which a microparticle is able to flow in an optical a...