US Patent Issued to Solmics on Feb. 10 for "Focus ring and plasma etching device including same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,741, issued on Feb. 10, was assigned to Solmics Co. Ltd. (Pyeongtaek-si, South Korea).

"Focus ring and plasma etching device including same" was invented by Kyungyeol Min (Seoul, South Korea), Yongsoo Choi (Seoul, South Korea), SungSic Hwang (Seoul, South Korea), Kyungin Kim (Seoul, South Korea), Jungkun Kang (Seoul, South Korea) and Su Man Chae (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A focus ring for mounting an etching target in a plasma etching device, includes a seating portion, including a seating surface configured to accommodate the etching target; and a main body, formed on an outer circumference of the seating por...