US Patent Issued to SLT Technologies on July 7 for "Group III nitride substrate with oxygen gradient, method of making, and method of use" (Washington Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,604, issued on July 7, was assigned to SLT Technologies Inc. (San Diego).

"Group III nitride substrate with oxygen gradient, method of making, and method of use" was invented by Mark P. D'Evelyn (Vancouver, Wash.), Keiji Fukutomi (Vancouver, Wash.), Drew W. Cardwell (Camas, Wash.) and David N. Italiano (Washougal, Wash.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure include techniques related to techniques for processing materials for manufacture of group-III metal nitride and gallium based substrates. More specifically, embodiments of the disclosure include techniques for substrates with a controlled oxygen grad...