ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,915, issued on Sept. 15, was assigned to Skyworks Solutions Inc. (Irvine, Calif.).
"Methods of manufacturing film bulk acoustic wave resonators" was invented by Satoru Matsuda (Toyonaka, Japan), Hiroyuki Tahara (Osaka, Japan), Jun Hashimoto (Osaka, Japan), Yasuhiro Yamauchi (Osaka, Japan) and Hiroki Kamiguchi (Hirakata, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are embodiments of a method of manufacturing film bulk acoustic wave resonators. The method comprises forming a sacrificial layer over a surface of a substrate to form a plurality of film bulk acoustic wave resonators on the surface of the substrate, forming a pie...