US Patent Issued to Skyworks Solutions on Aug. 11 for "Silicon-on-insulator substrate processing for transistor enhancement" (Massachusetts Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,707,716, issued on Aug. 11, was assigned to Skyworks Solutions Inc. (Irvine, Calif.).

"Silicon-on-insulator substrate processing for transistor enhancement" was invented by Hailing Wang (Acton, Mass.), Guillaume Alexandre Blin (Carlisle, Mass.), David Scott Whitefield (Andover, Mass.) and Paul T. DiCarlo (Marlborough, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Silicon-on-insulator (SOI) substrate processing for transistor enhancement is disclosed. In certain embodiments, a silicon substrate for an SOI process is separated into sub-regions or islands by dielectric. Thus, the substrate is changed from having one region and one shared contact int...