US Patent Issued to SKYWORKS GLOBAL on May 26 for "Steep skirt combination microelectromechanical system cavity filter and bulk acoustic wave filter" (South Korean, American Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,640,705, issued on May 26, was assigned to SKYWORKS GLOBAL PTE. LTD. (Singapore).

"Steep skirt combination microelectromechanical system cavity filter and bulk acoustic wave filter" was invented by Kwang Jae Shin (Yongin, South Korea) and Jiansong Liu (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A combination filter comprises a notch filter formed of acoustic wave resonators and a cavity filter electrically in series with the notch filter to provide for the combination filter to operate at higher powers and frequencies."

The patent was filed on Nov. 1, 2022, under Application No. 18/051,550.

*For further information, including images...