ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,010, issued on May 5, was assigned to SK Innovation Co. Ltd. (Seoul, South Korea).
"Optical multilayer structure and method of manufacturing the same" was invented by Cheol Min Yun (Daejeon, South Korea) and Chun Ho Kim (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical multilayer structure including a substrate; a shatterproof layer which is formed on at least one surface of the substrate and includes a polyimide film including a polyimide precursor, a polyimide, or a combination thereof including a structure of the following Chemical Formula 1, and inorganic particles; and a hard coating layer formed on the other surface...