US Patent Issued to SK Innovation on May 19 for "Polyimide precursor composition and optical multilayer structure formed using the same" (South Korean Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,739, issued on May 19, was assigned to SK Innovation Co. Ltd. (Seoul, South Korea).

"Polyimide precursor composition and optical multilayer structure formed using the same" was invented by Cheol Min Yun (Daejeon, South Korea) and Chun Ho Kim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are polyimide precursor composition including a polyimide precursor including a siloxane structure, and inorganic particles, and an optical multilayer structure including a structure in which a polyimide shatterproof layer formed using the composition is formed on a substrate. The optical multilayer structure according to one implementa...