US Patent Issued to SK hynix on Sept. 1 for "Semiconductor device and method for fabricating the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,152, issued on Sept. 1, was assigned to SK hynix Inc. (Gyeonggi-do, South Korea).

"Semiconductor device and method for fabricating the same" was invented by Jung Min Kwon (Gyeonggi-do, South Korea) and Seung Hwan Kim (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes: a first word line stack in which first word lines are vertically stacked; a second word line stack in which second word lines are vertically stacked; a word line isolation slit disposed between the first word line stack and the second word line stack; and a first vertical isolation layer disposed between the first word line stack an...