US Patent Issued to SK hynix, INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY on March 24 for "Slurry composition for a chemical mechanical polishing" (South Korean Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,039, issued on March 24, was assigned to SK hynix Inc. (Icheon, South Korea) and INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY (Seoul, South Korea).

"Slurry composition for a chemical mechanical polishing" was invented by Cheol Min Shin (Icheon, South Korea), Hyun Goo Kang (Icheon, South Korea), Ungyu Paik (Seoul, South Korea), Taeseup Song (Seoul, South Korea) and Hojin Jeong (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A slurry composition may include an abrasive, a solvent, and polyol. The abrasive may include any one of metal oxide, metal nitride, metal oxynitride, and a combination thereof. The polyol may ...