US Patent Issued to SK HYNIX, FEMTOMETRIX on April 14 for "Field-biased nonlinear optical metrology using corona discharge source" (South Korean, American Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,778, issued on April 14, was assigned to SK HYNIX INC. (Icheon-si, South Korea) and FEMTOMETRIX INC. (Los Angeles).

"Field-biased nonlinear optical metrology using corona discharge source" was invented by Seongmin Ma (Icheon-si, South Korea), Sangmin Kim (Icheon-si, South Korea), Jonghoi Cho (Icheon-si, South Korea) and Ming Lei (Seattle).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation while other utilize four wave-mixing or multi-wave mixing. Corona discharge may...