US Patent Issued to SK enpulse on March 3 for "Method and apparatus for manufacturing a photomask from a blank mask" (South Korean Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,369, issued on March 3, was assigned to SK enpulse Co. Ltd. (Pyeongtaek-si, South Korea).

"Method and apparatus for manufacturing a photomask from a blank mask" was invented by Sung Hoon Son (Seoul, South Korea), GeonGon Lee (Seoul, South Korea), Suk Young Choi (Seoul, South Korea), Hyung-joo Lee (Seoul, South Korea), Suhyeon Kim (Seoul, South Korea), Seong Yoon Kim (Seoul, South Korea), Min Gyo Jeong (Seoul, South Korea) and Inkyun Shin (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A blank mask includes a transparent substrate and a multilayer light shielding film disposed on the transparent substrate, the multilayer light shie...