US Patent Issued to Sinfonia Technology on Feb. 10 for "Mapping device and substrate accommodation state determination method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,549,835, issued on Feb. 10, was assigned to Sinfonia Technology Co. Ltd. (Tokyo).

"Mapping device and substrate accommodation state determination method" was invented by Keigo Sato (Tokyo), Yuji Miyashita (Tokyo) and Katsumi Yasuda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The load port includes a FOUP configured to accommodate a plurality of substrates in multiple stages, cameras configured to image each of the substrates accommodated in the FOUP and including a low-magnification camera with a wide horizontal angle of view and a high-magnification camera with a narrow horizontal angle of view, and a CPU configured to detect the accommodatio...