US Patent Issued to Sinfonia Technology on Aug. 18 for "EFEM and method of controlling supply amount of inert gas" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,874, issued on Aug. 18, was assigned to Sinfonia Technology Co. Ltd. (Tokyo).

"EFEM and method of controlling supply amount of inert gas" was invented by Masahiro Osawa (Tokyo) and Toshihiro Kawai (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An EFEM includes a housing having a substantially closed substrate transfer space in the housing and a control part configured to perform a control of supplying an inert gas into at least the housing. The control part includes an inert gas total supply amount setting part configured to set a total supply amount of the inert gas to be supplied into the housing; a door open/purge determination part config...