ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,442, issued on May 19, was assigned to SILTRONIC AG (Munich).
"Method for cleaning a semiconductor wafer" was invented by Damian Brock (Sankt Wolfgang, Germany) and Albert Kuehnstetter (Burghausen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A side of a semiconductor wafer is cleaned in the following order: (1) executing a first cleaning step, cleaning with ozonized water, and a subsequent rinsing step, rinsing with purified water; (2) executing a second cleaning step, which includes, executing a first treatment step, including treating with ozonized water, which is followed by executing a second treatment step, treating with a hydrogen fl...