ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,938, issued on April 7, was assigned to SILTRONIC AG (Munich).
"Device for drying semiconductor substrates" was invented by Sebastian Geissler (Brand-Erbisdorf, Germany) and Simon Rothenaicher (Erlbach, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device is for drying disc-shaped substrates. The device has an elongated body, which tapers upwards to form a wedge having an angle Alpha between two upper surfaces and an upper edge. The upper edge is configured to support a disc-shaped substrate. An upper surface of the two upper surfaces has a groove having an increasing groove depth with increasing distance from the upper edge."
The patent...