US Patent Issued to SILICON LIGHT MACHINES on Feb. 24 for "System and method for wavelength-selective attenuation and modulation" (California Inventor)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,851, issued on Feb. 24, was assigned to SILICON LIGHT MACHINES Corp. (San Jose, Calif.).

"System and method for wavelength-selective attenuation and modulation" was invented by Alexander Payne (Ben Lommond, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method are provided for spectral shaping of light from a broadband source including multiple wavelengths. The system includes a beam splitter (BS) to receive and transmit an input beam, a dispersive element to disperse the input beam into dispersed beams separated by wavelength, and optic-elements to direct the dispersed beams onto a spatial light modulator (SLM). The SLM selectiv...