US Patent Issued to Shinryo on July 21 for "Method for producing hydrogen gas-containing material and device for producing hydrogen gas-containing material" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,685,328, issued on July 21, was assigned to Shinryo Corp. (Kita Kyushu, Japan).

"Method for producing hydrogen gas-containing material and device for producing hydrogen gas-containing material" was invented by Ken Toyonaga (Kita Kyushu, Japan), Yuu Shibahara (Kita Kyushu, Japan), Kazumi Inoue (Kita Kyushu, Japan), Yukihito Suetsugu (Kita Kyushu, Japan), Daisuke Nishio (Kita Kyushu, Japan), Hirokazu Toyoshima (Kita Kyushu, Japan) and Tooru Takeda (Kita Kyushu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There are provided a method for producing a hydrogen gas-containing material in which higher safety than in a production method of the related a...