ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,124, issued on April 7, was assigned to SHIN-ETSU HANDOTAI Co. LTD. (Tokyo).
"Debris determination method" was invented by Masato Ohnishi (Nishigo-mura, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A debris determination method of determining, from an image obtained by an appearance inspection device, debris that occurs around an HLM on a backside of a wafer, including: replacing luminance data of the image with matrix data; extracting an HLM-printed region; obtaining a least-squares plane of luminance; obtaining normalized matrix data by subtracting the least-squares plane from the printed region; obtaining protrusion-side matrix data by su...