ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,407, issued on Sept. 9, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Resist composition and patterning process" was invented by Jun Hatakeyama (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound consisting of a cyclic ammonium cation and an anion derived from a fluorinated 1,3-diketone compound, fluorinated Beta-keto ester compound or fluorinated imide compound. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone."
The patent w...