US Patent Issued to Shin-Etsu Chemical on Sept. 1 for "Process for preparing conjugated diene compound utilizing intramolecular sigmatropic rearrangement reaction" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,115, issued on Sept. 1, was assigned to Shin-Etsu Chemical Co. Ltd. (Tokyo).

"Process for preparing conjugated diene compound utilizing intramolecular sigmatropic rearrangement reaction" was invented by Yuki Miyake (Joetsu, Japan), Yusuke Nagae (Joetsu, Japan) and Takeru Watanabe (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to A process for preparing a conjugated diene compound, the process comprising: subjecting, to an intramolecular sigmatropic rearrangement reaction, a conjugated diene compound (1) of the following general formula (1), wherein Z represents a halogen atom, a methyl group, a hydroxy gr...