US Patent Issued to SHIN-ETSU CHEMICAL on Oct. 14 for "Material for forming organic film, patterning process, and compound" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,441,712, issued on Oct. 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Material for forming organic film, patterning process, and compound" was invented by Daisuke Kori (Joetsu, Japan), Naoki Kobayashi (Shiojiri, Japan) and Yasuyuki Yamamoto (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A material for forming an organic film, containing: a compound shown by formula (1); and an organic solvent. In formula (1), R1 represents one of the following formulae (2), R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group, an alkynyloxy group, an alkenyloxy group, a linear, branched, or cyclic alkyl group, a trif...