US Patent Issued to SHIN-ETSU CHEMICAL on Nov. 3 for "Patterning method of quantum dots, method for producing optical device, method for manufacturing backlight unit, and method for manufacturing image display device" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,890, issued on Nov. 3, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Patterning method of quantum dots, method for producing optical device, method for manufacturing backlight unit, and method for manufacturing image display device" was invented by Yoshihiro Nojima (Annaka, Japan), Kazuya Tobishima (Annaka, Japan) and Shinji Aoki (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A patterning method of quantum dots, the method includes the steps of coating with a mixture containing quantum dots and a curable resin on a substrate to obtain a resin layer, ejecting a curing agent in a pattern shape on the resin layer by an inkjet meth...