ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,532, issued on May 20, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Pellicle frame and pellicle" was invented by Yu Yanase (Annaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is to provide a pellicle frame in a frame shape, having an upper end face to arrange a pellicle film thereon and a lower end face to face a photomask, and which is characterized by being provided with a notched part from an outer side face toward an inner side face of the upper end face, and to provide a pellicle characterized by including the pellicle frame as a component."
The patent was filed on March 28, 2024, under Application No. ...