US Patent Issued to SHIN-ETSU CHEMICAL on June 30 for "Composition for forming silicon-containing metal hard mask and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,668,700, issued on June 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Composition for forming silicon-containing metal hard mask and patterning process" was invented by Naoki Kobayashi (Joetsu, Japan), Kanata Takizawa (Joetsu, Japan), Ryo Mitsui (Joetsu, Japan) and Toshiharu Yano (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is a composition for forming a silicon-containing metal hard mask, including: (A) a metal oxide nanoparticle; (B) a thermally crosslinkable polysiloxane (Sx) having no aromatic-ring-containing organic group; and (C) a solvent. This provides a composition for forming a silicon-contain...