US Patent Issued to SHIN-ETSU CHEMICAL on Dec. 16 for "Alkali-resistant water repellent member, method for producing said water repellent member, and method for improving alkali resistance and wear resistance of water repellent member" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,538, issued on Dec. 16, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Alkali-resistant water repellent member, method for producing said water repellent member, and method for improving alkali resistance and wear resistance of water repellent member" was invented by Ryuto Hayashi (Annaka, Japan) and Yuji Yamane (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An alkali-resistant water repellent member according to the present invention has: a silica layer on at least one surface of a base material, said silica layer having a film thickness of from 1 nm to 5 micro metre, while containing 50% by mass or more of silica nanoparticle...