US Patent Issued to SHIN-ETSU CHEMICAL on April 21 for "Method for producing nitrogen-containing organoxysilane compound" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,606,576, issued on April 21, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Method for producing nitrogen-containing organoxysilane compound" was invented by Masato Kawakami (Joetsu, Japan) and Yoichi Tonomura (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a compound (3), by reacting a compound (1) having R1 and R2 representing a hydrogen atom or a monovalent hydrocarbon group wherein a case where both R1 and R2 are a hydrogen atom is excluded, with a compound (2) having R3 representing a divalent hydrocarbon group, R4 and R5 representing a monovalent hydrocarbon group, X representing a halogen atom, and m r...