US Patent Issued to Shenzhen Rainslab Technology on Sept. 15 for "Eye mask and control method" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,071, issued on Sept. 15, was assigned to Shenzhen Rainslab Technology Co. Ltd (Shenzhen, China).

"Eye mask and control method" was invented by Cihang Li (Shenzhen, China) and Jinhui Ma (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "An eye mask and a control method thereof are provided. The eye mask includes a casing, a first information prompting device and a second information prompting device arranged on the casing. The first information prompting device is configured for internally giving information prompts, the second information prompting device is configured for externally giving information prompts. The control method inclu...